Cholley Relaxing & After Sun Mask
(150ml)
Active ingredients: linden, rosemary, horsetail millet, amino acids, hyaluronic acid, arbutin.
Especially for the skin damaged by the external environment (such as wind, sun or pollution). Can relieve redness, swelling and microvascular emergence after sun exposure
Shape, repair injured or fragile skin, make skin soft and bright. Can be used as a mask or cream. (Applicable to face, neck and chest)